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A Korean Company is looking for nanofiltration (NF) technology on Developer Recycling System (DRS) that removes photoresist (PR) from used developing liquid.

Country of Origin: South Korea
Reference Number: TRKR20191025001
Publication Date: 4 November 2019

Summary

A Korean manufacturer of Developer Recycling System (DRS) and Developer Control System (DCS) is looking for a partner who has nanofilteration (NF) technology under manufacturing or service agreement to improve its existing DRS.
NF technology removes photoresist from used developing liquid.

Description

A Korean company started its main field of business in full-length control in the field of manufacturing semiconductors and LCD equipment in 2005. With steady growth since establishment, the company has developed and produced high-purity Central Chemical Supply System (CCSS), and Chemical Recycle System (CRS), which is liquid chemical reproducing equipment. Particularly, for reproducing equipment, the company has been recognized by a leading domestic large conglomerate for its technology and has succeeded in receiving orders from overseas (China and Taiwan) to be recognized globally for its reliable capability.

In the production of high-resolution products including LCD, LED and OLED, the display proceeds with the photo litho process using photosensitive material for the internal circuit composition. Most of the components are usually removed after the circuit is composed, but the photoresist applied to high-resolution products will remain inside the cell such as OC and bank layer for its flattening and bulk-head function.

The Developer Recycling System (DRS) developed by the company is a system that selectively separates photoresist (PR), a photosensitive material dissolved in wasted developer, from used developing liquid and regenerates it to the level of the new liquid.

The chemicals recycled through this recycling system are supplied back to the developer equipment to minimize the number of wastes. These noticeable advantages also lead to cost reduction on both the process and treatment for wasted liquid.

As the most important component of DRS system, Nanofilteration (NF) system takes away photoresist (PR) from used developing liquid which is the first step to recycle used developing liquid.

This DRS system requires two sets of nano-filters to remove PR more than 80%, meaning that recycling rate is more than 90%. In order to achieve this recycling rate, the company is looking for nanofiltration (NF) system as below.

This is the main features and specifications.
1. Grade: Industrial
2. NF Operation Pressure: 40 Bar
3. Housing Operation Pressure: 10 Bar
4. Type: Spiral Wound
5. Membrane material: PES
6. NF Module Rage: MWCO 1500 (Molecular weight cut off)

The potential partner has NF technology and the partnership considered is manufacturing or service agreement to apply this technology to its DRS system.
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Expertise sought

The company wishes to find nanofiltration (NF) system on Developer Recycling System (DRS) system that removes photoresist (PR) from used developing liquid. Please refer to the specifications below. 

1. Grade: Industrial
2. NF Operation Pressure: 40 Bar
3. Housing Operation Pressure: 10 Bar
4. Type: Spiral Wound
5. Membrane material: PES
6. NF Module Rage: MWCO 1500 (Molecular weight cut off)

Requested partner

The partner sought specializes in nanofiltration (NF) system, especially can produce nano-filters to remove photoresist and is capable of doing so with the particular specification required.

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